Products

SuperClean™ 1800-6

This system is Marteq’s high-performance, front-loading, 200mm dryer. The 1800-6can be loaded and operated automatically or manually, and is available with a variety  of single and double-stacked housings. The 1800-6’s deepdrawn stainless steel bowl with optional RA-10finish, high purity plumbing, and patented nitrogen labyrinth motor shaft seal all contribute to excellent particle performance at 0.15µm and smaller sizes. An ESD hardened multi-step, multi-recipe controller offers flexible process design.

1800-6-front-loading-spin-rinser-dryer

• Front-loading

• Automation compatible

• Single cassette for 200mm or smaller wafers

• Single or double-stack housings including chaseway service access

• Multi-recipe controller

• Low to neutral particle adders

• Front-loading, on-axis design

• Single cassette capacity up to 200mm  wafers

• Easily integrated into fully-automated and  manual

• production environments

• Available in several single-unit or double-stack configurations with standard  or bay  and chase cabinets

• The drying performance standard in many of  the world’s most advanced sub-micron fabs

• Patented non-contact, nitrogen labyrinth seal

• Deep-drawn 316 stainless-steel bowl

• Available RA-10finish bowl

• All-PFA plumbing, fittings, valves

• Strategically located spray nozzles

• Accurate rpm control to ±4rpm

• Low to neutral particle adders ≤0.15µm

• Few mechanics for high MTBF and uptime

• Precision indexing allows reliable end- effector cassette interfacing

• ESD “hardened,” SECS-II compatible controller

• Sensors for door open, closed, and obstructed; rotor indexed; N2 flow, N2 pressure,  and more

• Remote keypad and controls

• Quick-release and unobstructive  housing designs allow for fast and easy service access
 

Processes
Rinse and dry steps following:

• Pre-Diffusion Clean, SC-1 Clean, SC-2 Clean

• Monitor Wafer Clean, Post-laserscribe Clean

• Post-Silicon-Polish Clean, Post-CMP Clean

Pre-Epi / Post-Epi Deposition Cleans

• Post-Poly Deposition Clean, Post-Silicon-Etch Clean

• Nitride Strip, Titanium Strip, DHPH Etch

• Solvent Cleans, Pre-Silicide Clean

• Backside CVD Clean, Resist Strip

Substrates

• Silicon wafers, thin wafers

• GaAs wafers

• Silicon Carbide

• Hard disks

• Masks, Glass, and more