SuperClean™ 1800-6
This system is Marteq’s high-performance, front-loading, 200mm dryer. The 1800-6can be loaded and operated automatically or manually, and is available with a variety of single and double-stacked housings. The 1800-6’s deepdrawn stainless steel bowl with optional RA-10finish, high purity plumbing, and patented nitrogen labyrinth motor shaft seal all contribute to excellent particle performance at 0.15µm and smaller sizes. An ESD hardened multi-step, multi-recipe controller offers flexible process design.
• Front-loading
• Automation compatible
• Single cassette for 200mm or smaller wafers
• Single or double-stack housings including chaseway service access
• Multi-recipe controller
• Low to neutral particle adders
• Front-loading, on-axis design
• Single cassette capacity up to 200mm wafers
• Easily integrated into fully-automated and manual
• production environments
• Available in several single-unit or double-stack configurations with standard or bay and chase cabinets
• The drying performance standard in many of the world’s most advanced sub-micron fabs
• Patented non-contact, nitrogen labyrinth seal
• Deep-drawn 316 stainless-steel bowl
• Available RA-10finish bowl
• All-PFA plumbing, fittings, valves
• Strategically located spray nozzles
• Accurate rpm control to ±4rpm
• Low to neutral particle adders ≤0.15µm
• Few mechanics for high MTBF and uptime
• Precision indexing allows reliable end- effector cassette interfacing
• ESD “hardened,” SECS-II compatible controller
• Sensors for door open, closed, and obstructed; rotor indexed; N2 flow, N2 pressure, and more
• Remote keypad and controls
• Quick-release and unobstructive housing designs allow for fast and easy service access
Processes
Rinse and dry steps following:
• Pre-Diffusion Clean, SC-1 Clean, SC-2 Clean
• Monitor Wafer Clean, Post-laserscribe Clean
• Post-Silicon-Polish Clean, Post-CMP Clean
• Pre-Epi / Post-Epi Deposition Cleans
• Post-Poly Deposition Clean, Post-Silicon-Etch Clean
• Nitride Strip, Titanium Strip, DHPH Etch
• Solvent Cleans, Pre-Silicide Clean
• Backside CVD Clean, Resist Strip
Substrates
• Silicon wafers, thin wafers
• GaAs wafers
• Silicon Carbide
• Hard disks
• Masks, Glass, and more